Mini E-beam Evaporator

The Oxford Applied Research mini e-beam evaporators are employed to deposit ultra-pure films of materials. The deposition rate is highly controllable, allowing the instruments to be employed in Surface Science or thin-film applications. Full control from <0.1A/min to >50A/min is achieved for many materials. It is also possible to co-evaporate up to four materials with independent regulation of the deposition rate from a single power supply.

  • Low contamination, low particulate generation, and high reliability
  • No moving parts and direct water-cooling of the target holder
  • Extremely efficient heat transfer


Controllable deposition rate
Full control from <0.1A/min to >50A/min is achieved for many materials.

At 100mm from the source exit the evaporant beam can cover a 20×20mm sample with uniformity better than 98%.

Ion Current Monitoring
All evaporators are equipped with ion flux monitoring which not only measure the current in the beam, but also extract the vast majority of the ions, leaving the beam predominantly neutral.

Software control (EGCO4) – Optional hardware additions to the power supply allow control from Windows-based software, which allows control of key parameters inherent to the operation and greatly simplifies practical operation for the user.

All evaporators can be equipped with an integral shutter.

Hardware flux control (EGN1 and EGN4)
The evaporator power supplies can be externally or internally controlled by optional hardware designed to maintain a constant deposition rate.




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