Free Evaluation Scan

    We have several of our products available for demonstration. We are happy to provide a free demonstration on one of the instruments for new customers to help determine if the system is right for your application. If you'd like to request a free demo, please complete the form below:

    1-866-334-4MPI (4674)
    Home / Products / Graphene / TCVD-RF100CA – RF/MW Module

    TCVD-RF100CA – RF/MW Module

    Premium Custom Design Dual CVD System with a Glove Box 

    A Chemical Vapor Deposition (CVD) system for the synthesis of 2D materials at scales from a chip to a wafer, including synthesis of graphene, h-BN, TMDC’s on various substrates by use of gas-phase or solid precursors and metal-organic (MO) sources.  The synthesized samples can be transferred to a glove box filled with inert gases for further processes without exposure to environmental effects.

    For the development and research into future materials and graphene, h-BN, CNT, TMDC’s, the TCVD-DC100CA is the quality tool of choice that comes with a vast knowledge of know-how.

    The TVCD-DC100CA Features

    • Automatic control system
    • Optimized for Graphene, CNT, h-BN and TMDC growth
    • Water cooling and turbo pump for synthesis and environmental stability
    • Process temperature: ~1,100 degree C
    • Uniformity of Film Thickness: + or – 3%
    • Movable furnace method is our unique knowhow for fast heating and fast cooling of the sample
    • Standard Safety box

    The TCVD-100A Advantages

    Quality, advanced equipment that is customizable to your research needs.

    • Furnaces – dual furnace with RF M/W Module
    • Chamber size – 4 inch diameter quartz -dual tube
    • Pumping system – Turbo pump
    • Gas Control Units – Up to 10 gases controlled by separate MFC automatic controls + 2 extra ports
    • 3 metal organic source injection ports are included

    Contact Micro Photonics for more information at 610-366-7103 or

    • Size: 118(W) x 71(H) x 30(D) inches
    • Designed for safety: Enclosed in a safety cabinet
    • Gas supply: Up to 10 gases and 3 MO sources for gas-phase synthesis
    • Motor-controlled movable heaters for fast heating and cooling (patented)
    • Fully computer-controlled programmable recipes
    • Invited training for full sample preparation processes for synthesis, etching, and transfer
    • Supply of high-quality source material
    • CVD chambers connected to a Glove Box. Free from air exposure!
    TCVD-RF100CA Specifications
    CVD Reactor
    Tube type 4 inch diameter quartz
    Substrate Size

    Lateral insertion of 10mm to <4 inch wafers possible. (Loading frames for small samples)

    Rolled metallic foils can be loaded to synthesize A4 sized or larger 2D materials


    Dual-zone heater and controller for graphene/h-BN synthesis. Single-zone precursor heater and Dual-zone deposition heater for TMDC synthesis

    The heaters are movable along two rails and the distance can be motor-controlled, enabling 10 degree C/sec or faster temperature change rate

    Base Pressure
    10-5 mbar (depending on the dryness of source)
    Operating Pressure
    10-3 mbar – 1 bar

    Max 10 gas lines

    Metal oxide sources of various transition metals placed in Heat Zone 1 for solid source growth

    Other Metal Organic (MO) sources

    Extra 3 Metal-Organic source injection ports are included

    Low-T cold trap for residual sources

    Flow Control

    Precursor gases: -.1 – 10 sccm

    Other gases: 10-1000 sccm

    Automatic Flow control


    Turbo pump 450 l/s (ISO160)<10-6 mbar

    Dry scroll pump < 10-1 mbar

    Sample Switching
    Position switching by sample loading stage
    System Control
    Control PC system(12″ touch, dual core)

    Graphene Resources



    We work with you to make it possible, helping you through the process.



    A complete resource learning center for all of your project needs.


    Graphene Buyer’s Guide

    A step-by-step guide to finding the best Graphene solutions for you.

    Request more information