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TCVD-DC100CA – Dual Chamber System

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TMDC Synthesis - Automated Dual Furnace Thermal CVD System  

Graphene Square introduces the future with the TCVD-D100CA. An advanced system for reliable growth of TMDC materials such as MoS2, WSe2, etc. The system is equipped standard with movable dual furnaces, enabling the fast heating and fast cooling of source materials and substrates which are important for synthesis of high quality TMDC’s.

If a standard setup of 3 heating zones and 4 separate MFC’s with full computer control is not enough, the TCVD-D100CA is expandable to use 4 heating zones and an impressive 10 MFC’s for gas control. Synthesis of multiple materials has not been easier on one instrument. It is an essential instrument for R&D synthesis of TMDC’s and shared lab instrumentation where different groups need different gases. Optimized for TMDC’s, this instrument can also handle h-BN, CNT and Graphene.

The TVCD-D100CA Features

  • Advanced Computer Controlled Automatic System
  • Optimized for Graphene, CNT, h-BN and TMDC growth
  • Water cooling for constant stability of the system and material synthesis
  • Process temperature: ~1,100 degree C
  • Uniformity of Film Thickness: + or – 3%
  • Movable furnace method is our unique knowhow for fast heating and fast cooling of the sample
  • Standard Safety box

The TCVD-100A Advantages

Quality, advanced equipment that is customizable to your research needs. Advanced computer controlled system for TMDC, CNT, h-BN and Graphene

  • Furnaces – Single, dual (3 heating zones Standard), or a single  or with RF M/W Module, or Triple (4 heating zones)
  • Chamber size – 4 inch standard, or your choice of 2 inch, 6 inch or 8 inch
  • Pumping system – Oil type, dry scroll pump, or additional mechanical turbo pumps for required pumping
  • Gas Control Units – 4 MFC’s standard but able to equip 10 MFC’s

Contact Micro Photonics for more information at 610-366-7103 or info@microphotonics.com

  • Size: 90.5(W) x 70(H) x 30(D) inches
  • Designed for safety: Distinctive features for user safety in the research environment – Safety box
  • Cost-effective: High-quality results at a fraction of the cost
  • Advanced Controls: Advanced computer controlled automatic system
  • Wide range of applications: Optimized for graphene, CNT, h-BN, TMDC growth
  • Process Temperature: ~1,100 degree C
  • Uniformity of Film thickness: +-3%
  • Movable furnace method is our unique knowhow for fast heating and fast cooling of the sample
TCVD-D100CA Customization
Furnace

Single – 2 heating zones

Dual – 3 heating zones(standard)

Triple – 4 heating zones

Single or dual +RF M/W Module
Chamber Size

2 inch

4 inch (standard)

 6 inch

8 inch
Pumping Unit

Oil type rotary pump (standard)

Dry scroll pump

Additional: Mechanical turbo pump
Gas Control Unit

3 MFCs + 1 spare (standard)

Up to 10 MFCs

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