Ultra-High Vacuum for Uniform Thin Film Deposition

The mini E-beam from Oxford Applied Research can be used with rod or crucibles to evaporate and deposit uniform thin layers on substrates under Ultra-High Vacuum conditions. The EG series provide a voltage range of 0-1000V plus hardware flux control and shutters, and are high quality E-beam evaporators. The EG series can be equipped with up to 4 pockets and ability to co-evaporate 2 pockets at a time. 

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Calibrated low flux rate (material dependent)

The Oxford Applied Research mini E-beam provides a calibrated low flux rate, which is material dependent. The Silicon coverage is calculated to be 0.2ML from this image, therefore a 4nA flux  corresponds to a rate of 0.8ML/min (0.11nm/min). Data provided by Dr. Matt Butcher: University of New South Wales, Australia

Deposition and Ion Current Rates

This graph demonstrates the typical Molybdenum (Mo) deposition and Ion Current rate curves compared to Power (Watts) input, in which Mo was used in Rod form in the Oxford Applied Research EG Series Mini E-beam evaporator.

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